A comparative study of direct current magnetron sputtering and high power impulse magnetron sputtering processes for CNx thin film growth with different inert gases
  • Metaadatok
Tartalom: http://real.mtak.hu/34984/
Archívum: REAL
Gyűjtemény: Status = Published
Subject = Q Science / természettudomány: QD Chemistry / kémia: QD02 Physical chemistry / fizikai kémia
Subject = Q Science / természettudomány: QC Physics / fizika
Type = Article
Cím:
A comparative study of direct current magnetron sputtering and high power impulse magnetron sputtering processes for CNx thin film growth with different inert gases
Létrehozó:
Schmidt, S.
Czigány, Zsolt
Wissting, J.
Greczynski, G.
Janzén, E.
Dátum:
2016
Téma:
QC Physics / fizika
QD02 Physical chemistry / fizikai kémia
Tartalmi leírás:
Típus:
Article
PeerReviewed
Formátum:
text
Azonosító:
Schmidt, S. and Czigány, Zsolt and Wissting, J. and Greczynski, G. and Janzén, E. (2016) A comparative study of direct current magnetron sputtering and high power impulse magnetron sputtering processes for CNx thin film growth with different inert gases. Diamond and Related Materials, 64. pp. 13-26. ISSN 0925-9635
Kapcsolat:
https://dx.doi.org/10.1016/j.diamond.2016.01.009